LITHOGRAPHY FOR MICRO-ELECTRONICS

摘要

Synchrotron-radiation-based X-ray lithography has been studied for more than 15 years as an alternative to conventional UV lithography. Storage rings, beamlines, X-ray masks, X-ray steppers and other components have been developed and optimized for X-ray lithography. Compact rings have therefore become commercially available, beamlines have been optimized for practical use, and test devices can now be fabricated because of improved total accuracy in the X-ray masks and steppers. This report discusses the status of key techniques involving synchrotron radiation sources, beamlines, X-ray masks, and X-ray steppers.