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Structural analysis of ZnO thin films obtained by d.c. sputtering and electron beam evaporation

机译:d.c.获得的ZnO薄膜的结构分析溅射和电子束蒸发

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ZnO thin films were produced by argon plasma assisted electron beam vacuum evaporation and d.c. magnetron sputtering deposition techniques. ZnO films are used in solar cells as transparent contact in heterojunction cells, and can be deposited on a variety of substrates by different techniques, including electron beam deposition and sputtering and laser ablation. ZnO thin films were prepared for photovoltaic applications and the structural properties were studied. The results showed that the sputtering and the vacuum evaporation techniques resulted, respectively, in a textured ZnO and ZnO plus Zn mixed phases. The annealing of the vacuum evaporation ZnO films resulted in films with high crystallinity.
机译:ZnO薄膜是通过氩等离子体辅助电子束真空蒸发和d.c.制备的。磁控溅射沉积技术。 ZnO膜在太阳能电池中用作异质结电池中的透明接触,可以通过不同的技术(包括电子束沉积,溅射和激光烧蚀)沉积在各种基板上。制备了ZnO薄膜用于光伏应用,并研究了其结构性能。结果表明,溅射和真空蒸发技术分别导致织构的ZnO和ZnO加Zn混合相。真空蒸发ZnO薄膜的退火导致薄膜具有高结晶度。

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