Time-Resolved Electron Energy Distributions and Plasma Characteristics in a Pulsed Capacitively Coupled Plasma

摘要

Pulsed capacitively coupled plasmas (CCPs) are attractive for controlling electron energy distributions $f(varepsilon)$ and plasma properties for microelectronic fabrication. A conceptual design of a pulsed CCP is discussed which provides additional control over the magnitude and composition of the reactive fluxes to the wafer. We present computed images of time-resolved $f(varepsilon)$ and electron density during a pulse period.