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Dangling bond defects in SiC: An ab initio study

机译:SiC中悬空键缺陷的从头算研究

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摘要

We report first-principles microscopic calculations of the properties of defects with dangling bonds in crystalline 3C-SiC. Specifically, we focus on hydrogenated Si and C vacancies, divacancies, and multivacancies. The latter is a generic model for an isolated dangling bond within a bulk SiC matrix. Hydrogen serves to passivate electrically active defects to allow the isolation of a single dangling-bond defect. We used hybrid density-functional methods to determine energetics and electrical activity. The present results are compared to previous 3C-SiC calculations and experiments. Finally, we identify homopolar carbon dangling-bond defects as the leakage causing defects in nanoporous SiC alloys.
机译:我们报告了晶体3C-SiC中带有悬空键缺陷性质的第一性原理微观计算。具体来说,我们专注于氢化的Si和C空位,双空位和多空位。后者是块状SiC基质中孤立的悬空键的通用模型。氢用于钝化电活性缺陷,以隔离单个悬空键缺陷。我们使用混合密度泛函方法来确定能量和电活动。将当前结果与以前的3C-SiC计算和实验进行比较。最后,我们将同极性碳悬挂键缺陷识别为引起纳米多孔SiC合金缺陷的泄漏。

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  • 来源
    《Physical review》 |2018年第4期|045203.1-045203.7|共7页
  • 作者

    Blair R. Turtle;

  • 作者单位

    Department of Physics, Penn State Behrend, Erie, Pennsylvania 16563 USA;

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  • 正文语种 eng
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