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首页> 外文期刊>Physica status solidi (a) Applications and materials science >Characteristics of Multi-Quantum-Well Laser Diodes with Surface Electrode Structure Directly Bonded to InP Template on SiO_2/Si Substrate
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Characteristics of Multi-Quantum-Well Laser Diodes with Surface Electrode Structure Directly Bonded to InP Template on SiO_2/Si Substrate

机译:具有表面电极结构的多量子孔激光二极管的特性直接粘合到SiO_2 / Si衬底上的INP模板

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摘要

The lasing characteristics of separate-confinement-heterostructure multi-quantum-well (SCH-MQW) laser diodes (LDs) grown on InP templates bonded to aSiO_2/Si substrate using the hydrophilic bonding method are investigated. Thelayers of the SCH seven-quantum-well-structured LD are grown by low-pressuremetal-organic vapor-phase epitaxy. After the pulsed power supply of a high-mesawaveguide is tested with a surface electrode structure, the LD grown on an InP/SiO_2/Si substrate is found to exhibit superior lasing characteristics compared toan LD grown on an InP/Si substrate, and the threshold current density isequivalent to that of a surface-electrode-structured LD grown on an InP substrate.The slope efficiency of the LD grown on the InP/SiO_2/Si substrate is comparedwith that of an LD grown on an InP/Si substrate.
机译:单独限制 - 异质结构多量子的激光特性 - 井(Sch-MQW)在INP模板上生长的激光二极管(LDS)绑定到a 研究了使用亲水键合方法的SiO_2 / Si衬底。 这 SCH 7-量子良好结构的LD层由低压生长 金属 - 有机气相外延。 经过高级别的脉冲电源 用表面电极结构测试波导,LD在INP / 发现SiO_2 / Si衬底与相比表现出优异的激光特性 在InP / Si衬底上生长的LD,阈值电流密度是 相当于在INP基板上生长的表面电极结构LD的。 比较了在INP / SIO_2 / SI衬底上生长的LD的斜率效率进行了比较 具有在INP / Si衬底上生长的LD。

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