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The structural, morphological and magnetic characteristics of Mn-implanted nonpolar a-plane GaN films

机译:锰注入非极性a面GaN薄膜的结构,形貌和磁性

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摘要

Dilute magnetic nonpolar GaN films have been fabricated by implanting Mn into unintentionally doped nonpolar a-plane GaN films at room temperature, and a subsequent rapid thermal annealing. The X-ray diffraction analysis shows that after rapid thermal annealing the peak of the GaN X-ray diffraction curve shifts to a lower angle, indicating a slight expansion ofrnthe GaN crystal lattice. Atomic force microscopy analysis shows that the annealing process does not change the morphology of the sample greatly. Magnetic property analysis indicates that the as-annealed sample shows obvious ferromagnetic properties.
机译:稀磁性非极性GaN膜是通过在室温下将Mn注入到无意掺杂的非极性a面GaN膜中并随后进行快速热退火而制成的。 X射线衍射分析表明,在快速热退火之后,GaN X射线衍射曲线的峰移动到一个较小的角度,表明GaN晶格略有膨胀。原子力显微镜分析表明,退火过程不会明显改变样品的形态。磁性能分析表明,退火后的样品显示出明显的铁磁性能。

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  • 来源
    《Physica status solidi》 |2009年第1期|91-93|共3页
  • 作者单位

    Semiconductor Lighting Technology Research and Development Center, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, P.R. China;

    Semiconductor Lighting Technology Research and Development Center, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, P.R. China;

    Semiconductor Lighting Technology Research and Development Center, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, P.R. China;

    Semiconductor Lighting Technology Research and Development Center, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, P.R. China;

    Semiconductor Lighting Technology Research and Development Center, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, P.R. China;

    Semiconductor Lighting Technology Research and Development Center, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, P.R. China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    magnetic semiconductors; Ⅲ-Ⅴ semiconductors; chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.); impurity doping, diffusion and ion implantation technology;

    机译:磁性半导体Ⅲ-Ⅴ族半导体;化学气相沉积(包括等离子体增强CVD;MOCVD等);杂质掺杂;扩散和离子注入技术;

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