Influence of PE-ALD of CaP on the Silicon Wafers Quality

摘要

An attractive method of low-temperature plasma-enhanced atomic layer deposition (PE-ALD) of CaP on silicon wafer was recently proposed. In the present paper, the influence of the growth process on the quality of silicon wafers is explored by space charge capacitance techniques, C-V profiling and deep level transient spectroscopy (DLTS). No DLTS peak is observed for PE-ALD CaP deposited onto n-type wafer, meaning that the defect concentration is very low (less than 1 x 10~(12)cm~(-3)) and that the growth process does not affect the properties of the n-S wafer. For boron-doped p-type silicon, C-V profiling shows that there is no deactivation of boron doping after the PE-ALD process, as could have been expected from the presence of hydrogen in the plasma. Measurements on the reference Schottky diodes formed on the p-type Si wafer reveal the presence of the well-known Fe interstitial defects at the position E_v+0.38eV with a concentration of 3 x 10~(13)cm~(-3). PE-ALD of CaP leads to a modification of the response of this defect and to the appearance of another response in the low temperature range, possibly related to changes in the Fe interstitial defect environment or configuration. However, deep-levels were not detected in p-Si after PE-ALD, meaning that the quality of p-Si does not degrade.