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Optical properties of NiCrO_x thin films

机译:NiCrO_x薄膜的光学性质

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The optical properties of thin NiCrO_x layers were investigated by spectroscopic ellipsometry (SE). The layers were coated on float glass by magnetron sputtering at different oxygen partial pressures (20% to 30% oxygen in the sputtering gas) and the influence of the degree of oxidation was considered in details. The optical constants of the films n and k, in the visible to near infrared spectral range (0.35 to 1.7 Jim), appear to be extremely sensitive to their chemical composition. Complementary studies were carried out using Fourier transform infrared ellipsometry (FTIR-SE) to determine the optical conductivity of the films and compare it with four-points-probe measurements.
机译:NiCrO_x薄层的光学特性通过椭圆偏振光谱法(SE)进行了研究。在不同的氧分压下(溅射气体中的氧为20%至30%),通过磁控溅射将这些层涂覆在浮法玻璃上,并详细考虑氧化程度的影响。膜n和k的光学常数,在可见光到近红外光谱范围(0.35至1.7 Jim)内,似乎对其化学组成极为敏感。使用傅里叶变换红外椭偏仪(FTIR-SE)进行了补充研究,以确定薄膜的光导率,并将其与四点探针测量进行比较。

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