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Improved performance of quantum dot light-emitting diodes by hybrid electron transport layer comprised of ZnO nanoparticles doped organic small molecule

机译:ZnO纳米粒子掺杂有机小分子组成的混合电子传输层提高了量子点发光二极管的性能

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摘要

ZnO nanoparticles (NPs) are widely employed as the electron transport layer (ETL) material in quantum dot light-emitting diodes (QLEDs) due to their excellent electron transport properties and inherent stability. However, the unbalanced carrier injection caused by the redundant electron injection is a common phenomenon existing in QLEDs with ZnO ETL. Here, based on the lower electron mobility and shallower lowest unoccupied molecular orbit (LUMO) of most organic electron transport .materials than ZnO NPs, we report a strategy to modulate the electron transporting properties of ZnO NPs by doping organic small molecular electron transport materials. Several kinds of small molecular dopants including LiQ (lithium 8-quinolate), TPBi (1,3,5-tris(N-phenylbenzimidazol-2,yl) benzene), and BPhen (4,7-diphenyl-1,10-phenanthroline) are separately introduced to modify ZnO. The resulting device with LiQ-doped ZnO ETL at a doping ratio of 7 wt% exhibits the optimal performance at peak current efficiency (CE) and external quantum efficiency (EQE) up to 8.07 cd/A and 7.74%, which are about 1.93- and 1.94-fold higher than 4.19 cd/A and 3.98% of the device with pristine ZnO ETL, respectively. The improvement of performances can be mainly attributed to the inhibition of electron injection and interfacial exciton quenching by the use of LiQ-doped ZnO ETLs. This work may offer a promising method for fabricating high performance QLEDs and promote their application development in the display fields.
机译:ZnO纳米粒子(NPs)具有出色的电子传输性能和固有的稳定性,因此被广泛用作量子点发光二极管(QLED)中的电子传输层(ETL)材料。然而,由冗余电子注入引起的不平衡载流子注入是具有ZnO ETL的QLED中普遍存在的现象。在此,基于大多数有机电子传输材料比ZnO NPs更低的电子迁移率和更浅的最低未占据分子轨道(LUMO),我们报告了一种通过掺杂有机小分子电子传输材料来调节ZnO NPs的电子传输特性的策略。几种小分子掺杂剂,包括LiQ(8-喹啉锂),TPBi(1,3,5-三(N-苯基苯并咪唑-2,基)苯)和BPhen(4,7-二苯基-1,10-菲咯啉)分别引入)来改性ZnO。所得到的具有以7 wt%的掺杂比例掺杂LiQ的ZnO ETL的器件在峰值电流效率(CE)和外部量子效率(EQE)高达8.07 cd / A和7.74%(约为1.93-分别比带有原始ZnO ETL的器件的4.19 cd / A和3.98%高1.94倍。性能的提高主要归因于使用掺杂LiQ的ZnO ETL抑制电子注入和界面激子猝灭。这项工作可能为制造高性能QLED提供有前途的方法,并促进其在显示领域的应用开发。

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