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Repair of a mirror coating on a large optic for high laser damage applications using ion milling and over-coating methods

机译:使用离子铣削和过涂方法对高激光损伤应用的大型光学镜涂层的修复

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摘要

When an optical coating is damaged, deposited incorrectly, or is otherwise unsuitable, the conventional method to restore the optic often entails repolishing the optic surface, which can incur a large cost and long lead time. We propose three alternative options to repolishing, including (i) burying the unsuitable coating under another optical coating, (ii) using ion milling to etch the unsuitable coating completely from the optic surface and then recoating the optic, and (iii) using ion milling to etch through a number of unsuitable layers, leaving the rest of the coating intact, and then recoating the layers that were etched. Repairs were made on test optics with dielectric mirror coatings according to the above three options. The mirror coatings to be repaired were quarter wave stacks of HfO_2 and SiO_2 layers for high reflection at 1054 nm at 45 deg incidence in P-polarization. One of the coating layers was purposely deposited incorrectly as Hf metal instead of HfO_2 to evaluate the ability of each repair method to restore the coating's high laser-induced damage threshold (LIDT) of 64.0 J/cm~2. The repaired coating with the highest resistance to laser-induced damage was achieved using repair method (ii) with an LIDT of 49.0 to 61.0 J/cm_2.
机译:当光学涂层损坏时,不正确沉积或者不合适地,恢复光学器件的常规方法通常需要重新挖掘光学表面,这可能产生大的成本和长时间的时间。我们提出了三种替代方案来恢复,包括(i)使用离子铣削在另一种光学涂层下掩埋不合适的涂层,以蚀刻不合适的涂层,从光学表面蚀刻,然后使用离子铣削重新涂覆光学器件和(iii)为了蚀刻通过多个不合适的层,使涂层的其余部分完整,然后重新涂覆蚀刻的层。根据上述三种选择,在具有介电镜涂层的测试光学上进行维修。待修复的镜涂层是四分之一的HFO_2和SiO_2层,其在1054nm处的高反射,在p偏振中的45℃下的发生率。其中一种涂层作为HF金属而不正确地沉积不正确的沉积,而不是HFO_2,以评估每种修复方法恢复涂层的高激光诱导的损伤阈值(LIDT)为64.0J / cm〜2的能力。使用盖子为49.0至61.0J / cm_2的修复方法(ii),实现了具有最高抗激光诱导损伤的修复涂层。

著录项

  • 来源
    《Optical engineering》 |2017年第1期|011002.1-011002.9|共9页
  • 作者单位

    Sandia National Laboratories PO Box 5800 MS 1191 Albuquerque New Mexico 87185 United States;

    Sandia National Laboratories PO Box 5800 MS 1191 Albuquerque New Mexico 87185 United States;

    Sandia National Laboratories PO Box 5800 MS 1191 Albuquerque New Mexico 87185 United States;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    laser damage; optical coatings; HfO_2; SiO_2; ion milling; ion etching;

    机译:激光损坏;光学涂层;hfo_2;SiO_2;离子铣削;离子蚀刻;

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