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Polishing performance of magnetorheological finishing with flocculated and deflocculated aqueous polishing fluid

机译:絮凝和絮凝的水性抛光液对磁流变抛光的抛光性能

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摘要

We propose that a magnetorheological (MR) polishing fluid should be considered as a polydispersed suspension system due to its composition and appearance after sedimentation and that fluid can be divided into flocculated MR polishing fluid and deflocculated MR polishing fluid. Two kinds of MR polishing fluid are prepared using different additives, and removal function experiments are carried out on BK7 glass and a silicon modification layer on reaction-bonded silicon carbide, respectively. The performance of flocculated and deflocculated MR polishing fluid is investigated by removal function experiments. The experimental results demonstrate that performance of flocculated MR polishing fluid is superior to deflocculated MR polishing fluid in material removal rate, surface roughness, and removal function stability in long-term polishing processes.
机译:我们建议,磁流变(MR)抛光液由于其成分和沉淀后的外观而应被视为多分散悬浮液系统,并且该流体可分为絮凝MR抛光液和絮凝MR抛光液。使用不同的添加剂制备了两种MR抛光液,分别在BK7玻璃和反应结合的碳化硅上的硅改性层上进行了去除功能的实验。通过去除功能实验研究了絮凝和絮凝的MR抛光液的性能。实验结果表明,在长期抛光过程中,絮凝的MR抛光液的性能在材料去除率,表面粗糙度和去除功能稳定性方面优于絮凝的MR抛光液。

著录项

  • 来源
    《Optical engineering》 |2019年第2期|025104.1-025104.7|共7页
  • 作者单位

    Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, Key Laboratory of Optical System Advanced Manufacturing Technology, Changchun, China;

    Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, Key Laboratory of Optical System Advanced Manufacturing Technology, Changchun, China;

    Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, Key Laboratory of Optical System Advanced Manufacturing Technology, Changchun, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    magnetorheological finishing; magnetorheological polishing fluid; material removal rate; surface roughness; stability;

    机译:磁流变整理磁流变抛光液;材料去除率;表面粗糙度;稳定性;

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