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首页> 外文期刊>Nuclear Instruments & Methods in Physics Research. B, Beam Interactions with Materials and Atoms >Degradation in AlGaN/GaN HEMTs irradiated with swift heavy ions: Role of latent tracks
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Degradation in AlGaN/GaN HEMTs irradiated with swift heavy ions: Role of latent tracks

机译:快速重离子辐照的AlGaN / GaN HEMT中的降解:潜迹的作用

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摘要

AlGaN/GaN high electron mobility transistor (HEMT) devices were irradiated with swift heavy ions at different fluences. From structural and electrical studies, it was found that SHI irradiation leads to a significant deterioration of structural and electrical properties of the devices. Positive threshold voltage V-th was found to increase by about 85% as a result of irradiation with 1540-MeV Bi-209 ions at fluence of 1.7 x 10(11 )ions/cm(2), while this threshold voltage value was increased by 55% after irradiation with 2300-MeV Xe-129 at a fluence of 4 x 10(11) ions/cm(2). The maximum saturation drain current I-ds was decreased by about two orders of magnitude in the device after irradiation with Bi-209 ions. Quasi-continuous tracks were observed visually in the devices after irradiation with Bi-209 ions. The observed defects and disorders induced in the devices by SHI irradiation were found responsible for the decrease in carrier mobility and sheet carrier density, and finally, these defects resulted in the degradation of electrical characteristics of HEMTs.
机译:用不同的注量快速重离子辐照AlGaN / GaN高电子迁移率晶体管(HEMT)器件。从结构和电学研究发现,SHI辐射导致器件的结构和电学性能显着下降。发现以1.7 x 10(11)ions / cm(2)的通量辐照1540-MeV Bi-209离子后,正阈值电压Vth增加了约85%,而该阈值值却增加了在以4 x 10(11)离子/ cm(2)的通量辐照2300-MeV Xe-129后,可以减少55%。在用Bi-209离子辐照后,器件中的最大饱和漏极电流I-ds降低了大约两个数量级。用Bi-209离子辐照后,在设备中目视观察到准连续轨迹。发现观察到的由SHI照射在器件中引起的缺陷和紊乱是造成载流子迁移率和薄片载流子密度下降的原因,最后,这些缺陷导致了HEMT的电特性的下降。

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    Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Gansu, Peoples R China|UCAS, Beijing 100049, Peoples R China;

    Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Gansu, Peoples R China;

    Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Gansu, Peoples R China;

    PINSTECH, Nanomat Res Grp, Phys Div, Islamabad 45650, Pakistan;

    Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Gansu, Peoples R China;

    Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Gansu, Peoples R China;

    Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Gansu, Peoples R China|UCAS, Beijing 100049, Peoples R China;

    Xidian Univ, Sch Mechanoelect Engn, Xian 710071, Shaanxi, Peoples R China;

    Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Gansu, Peoples R China;

    Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Gansu, Peoples R China|UCAS, Beijing 100049, Peoples R China;

    Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Gansu, Peoples R China;

    Xidian Univ, Sch Adv Mat & Nanotechnol, Xian 710071, Shaanxi, Peoples R China;

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  • 正文语种 eng
  • 中图分类
  • 关键词

    GaN; HEMT; Swift heavy ion; Latent track; Electrical characteristics;

    机译:氮化镓;HEMT;快速重离子;潜迹;电学特性;

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