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首页> 外文期刊>Microwaves, Antennas & Propagation, IET >Noise performance of an AlGaN/GaN monolithic microwave integrated circuit (MMIC) low-noise amplifier under laser exposure
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Noise performance of an AlGaN/GaN monolithic microwave integrated circuit (MMIC) low-noise amplifier under laser exposure

机译:激光曝光下ALGAN / GAN单片微波集成电路(MMIC)低噪声放大器的噪声性能

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摘要

The aim of this study is to disclose how the performance of a gallium nitride (GaN)-based X-band low-noise amplifier is modified by applying a blue-ray (404 nm) laser beam. The tested amplifier employs an aluminium gallium nitride/GaN (AlGaN/GaN) high electron mobility transistor on silicon carbide whose dc and noise behaviour have been first analysed with and without optical illumination. Mild improvement of the gain together with severe degradation of the noise figure has occurred during light exposure with the amplifier operating according to the recommended bias condition. Conversely, pronounced improvement of the performance has taken place when the amplifier has been biased close to the transistor pinch-off point. The results presented in this work follow a previous intense activity carried out on devices and amplifiers based on gallium arsenide technology.
机译:本研究的目的是通过施加蓝射线(404nm)激光束来修改氮化镓(GaN)的X场低噪声放大器的性能。测试的放大器在碳化硅上采用氮化铝镓/ GaN(AlGaN / GaN)高电子迁移率晶体管,其DC和噪声行为首先通过和无光照明分析。在通过根据推荐的偏置条件操作的放大器操作期间,在光曝光期间发生了对噪声系数的严重降解的增益的温和改善。相反,当放大器靠近晶体管捏关点偏置时,发生了性能的发音改善。本作作品中提出的结果遵循基于砷化镓技术的装置和放大器进行的先前的激烈活动。

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