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Design of an oscillator with low phase noise and medium output power in a 0.25 µm GaN-on-SiC high electron-mobility transistors technology

机译:0.25 µm GaN-on-SiC高电子迁移率晶体管技术中具有低相位噪声和中等输出功率的振荡器的设计

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To investigate the effects of both the drain and gate bias voltages on the performance of GaN high electron-mobility transistors (HEMT) oscillator, a 0.25 μm GaN-on-SiC HEMT oscillator is presented in this study. Utilising the designed oscillator, the trade-off between phase noise and output power is effectively investigated at the circuit level. As a result, the designed oscillator can provide low phase noise and medium output power simultaneously. The phase noise at = -2.3 V and = 3.3 V is measured to be -112 dBc/Hz and -143 dBc/Hz at 100 kHz offset and 1 MHz offset, respectively, from a 4.954 GHz carrier, with an output power of more than 14 dBm. Moreover, the output power can be boosted to 26 dBm, if a drain bias 16 V is used, while good phase noise of -132 dBc/Hz @ 1 MHz is still achievable. The achieved phase noise is low among all reported GaN HEMT oscillators. This work has successfully demonstrated that the monolithic oscillator fabricated in GaN-on-SiC HEMT technology features low phase noise as well as medium output power simultaneously.
机译:为了研究漏极和栅极偏置电压对GaN高电子迁移率晶体管(HEMT)振荡器性能的影响,本研究提出了一种0.25μm的GaN-on-SiC HEMT振荡器。利用设计的振荡器,可以在电路级上有效地研究相位噪声与输出功率之间的折衷。结果,设计的振荡器可以同时提供低相位噪声和中等输出功率。在来自4.954 GHz载波的100 kHz偏移和1 MHz偏移下,在= -2.3 V和= 3.3 V时的相位噪声经测量分别为-112 dBc / Hz和-143 dBc / Hz。大于14 dBm。而且,如果使用16 V的漏极偏置,则输出功率可以提高到26 dBm,而在1 MHz时仍可实现-132 dBc / Hz的良好相位噪声。在所有报道的GaN HEMT振荡器中,实现的相位噪声都很低。这项工作成功地证明了采用GaN-on-SiC HEMT技术制造的单片振荡器具有低相位噪声和同时中等输出功率的特点。

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