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The effect of die attach voiding on the thermal resistance of chip level packages

机译:芯片贴装空隙对芯片级封装热阻的影响

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摘要

The presence of voids in the die bond region is known to adversely affect the thermal resistance of the packaged chip-level device. Unfortunately, such voids are easily formed in the solder layer during manufacturing, and are found to nucleate, grow and coalesce with thermal cycling. Although the relationship between package thermal resistance and voids has been examined extensively, little data exist concerning the precise effects of void size, configuration and position. The present study allows the experimental investigation of these effects through application of an innovative experimental technique that carefully controls void geometry and distribution. The results show that for small, random voids, the thermal resistance, θ_(jc), increases linearly with void volume percentage, V_%, according to the equation θ_(jc) = 0.007V + 1.4987, and for large, contiguous voids the increase follows the exponential relationship, θ_(jc)= 1.427e~(0.015V). At 73% voiding, θ_(jc) was found to increase 30% and 200% for random and contiguous voids, respectively.
机译:已知在芯片键合区域中存在空隙会不利地影响封装的芯片级器件的热阻。不幸的是,这样的空隙在制造过程中很容易在焊料层中形成,并且发现它们随着热循环成核,生长和聚结。尽管已经对封装热阻和空隙之间的关系进行了广泛的研究,但有关空隙尺寸,形状和位置的精确影响的数据很少。本研究允许通过应用创新的实验技术来仔细研究空隙的几何形状和分布,从而对这些影响进行实验研究。结果表明,对于小的随机空隙,根据方程θ_(jc)= 0.007V + 1.4987,热阻θ_(jc)随着空隙体积百分比V_%线性增加,而对于较大的连续空隙增加遵循指数关系θ_(jc)= 1.427e〜(0.015V)。在73%的空隙率下,随机和连续空隙率θ_(jc)分别增加30%和200%。

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