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Stress analysis and bending tests for GaAs wafers

机译:GaAs晶片的应力分析和弯曲测试

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摘要

Wafer made from single crystal gallium arsenide (GaAs) are used as substrate materials in micro- and opto-elec-tronic devices. During the various processes of manufacturing, the wafers are subjected to mechanical loads which may lead to fracture. The characterization of the fracture strength of the wafers need bending tests and a theoretical calculation of various stress distributions within the wafers. In this study we show that the nonlinear von Karman theory may serve as an appropriate tool to calculate the stress distributions as functions of the external load, while the Kirchhoff theory has turned out to be completely inappropriate. Our main focus is devoted to (ⅰ) calculation of the contact area between the load sphere and the wafer, (ⅱ) study of the influence of the anisotropic character of the material, (ⅲ) study of the important geometric nonlinearity. Finally we compare the calculated and theoretical load-flexure relations in order to demonstrate the high accuracy of the von Karman theory and its finite element implementation.
机译:由单晶砷化镓(GaAs)制成的晶圆被用作微电子和光电设备中的衬底材料。在各种制造过程中,晶片承受可能导致破裂的机械负荷。晶片断裂强度的表征需要弯曲测试和晶片内各种应力分布的理论计算。在这项研究中,我们表明,非线性冯·卡曼理论可以作为计算应力分布作为外部载荷函数的合适工具,而基尔霍夫理论却被证明是完全不合适的。我们的主要重点是(ⅰ)计算负载球与晶片之间的接触面积,(ⅱ)研究材料的各向异性特征的影响,(ⅲ)研究重要的几何非线性。最后,我们比较了计算的和理论的载荷-挠度关系,以证明von Karman理论及其有限元实现的高精度。

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