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Simulation and modelling of VDMOSFET self protection under TLP-stress

机译:TLP应力下VDMOSFET自保护的仿真与建模

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摘要

We present a simple and practical model for modelling the electrical behaviour of scalable vertical diffused MOSFETs (VDMOSFETs) under TLP stress. The trigger current is found to be dependent from gate-source voltage and geometry. A scalable model for analog circuit simulation is developed.rnAs application example, self protection of VDMOS in resistive coupled gate configuration is investigated. For this purpose the device behaviour under TLP stress is modelled. The model is shown to predict VDMOS self protection under TLP stress for a wide range of geometries in an excellent way. A comprehensive analytical model calculation is added which explains the range of model validity. Within this range maximum HBM rating of the resistive gate coupled devices is predicted correctly.
机译:我们提出了一个简单实用的模型,用于在TLP应力下对可伸缩垂直扩散MOSFET(VDMOSFET)的电性能进行建模。发现触发电流取决于栅极-源极电压和几何形状。作为应用实例,研究了电阻耦合门结构中VDMOS的自保护。为此,对在TLP应力下的器件行为进行了建模。该模型显示出以出色的方式预测TLP应力下VDMOS在各种几何形状下的自我保护的能力。添加了全面的分析模型计算,可以解释模型有效性的范围。在此范围内,可以正确预测电阻栅耦合器件的最大HBM额定值。

著录项

  • 来源
    《Microelectronics reliability》 |2010年第2期|183-189|共7页
  • 作者

    Martin Sauter; Joost Willemen;

  • 作者单位

    University of the Federal Armed Forces Munich, Department of Electrical Engineering and Computer Science, Wemer-Heisenberg-Weg 39, D-85577 Neubiberg, Cermany;

    Infineon Technologies, Business Unit Automotive Power Semiconductors, Am Campeon 1, D-85579 Neubiberg, Cermany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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