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Defect Localization using Voltage Contrast I_DDQ Testing

机译:使用电压对比I_DDQ测试进行缺陷定位

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I_DDQ testing detects a majority of faults occurring in logic. ICs. Nethertheless, it has not eliminated the complex task of fault isolation at the silicon level of ICs. Liquid Crystal or Emission Microscopy can deal with this challenge. Unfortunately these two techniues lack sensitivity for some defects when the abnormal current consumption (I_DDQ) remains weak. On the other hand we can use very powerful toos like the electories, pepole have underlined the interest of merging the two techniques (I_DDQ testing and Voltage Contrast) to get fast and accurate defect localization. In this paper, we will move on to the next step of identifying practical key issues necessary for obtaining results on current VLSI.
机译:I_DDQ测试可检测逻辑中发生的大多数故障。集成电路。尽管如此,它仍未消除IC芯片级的故障隔离这一复杂任务。液晶或发射显微镜可以应对这一挑战。不幸的是,当异常电流消耗(I_DDQ)仍然很弱时,这两种技术对某些缺陷缺乏敏感性。另一方面,我们可以使用像选举这样的功能强大的工具,pepole强调了将两种技术(I_DDQ测试和电压对比)相结合以快速,准确地定位缺陷的兴趣。在本文中,我们将继续进行下一步工作,以确定在当前VLSI上获得结果所必需的实际关键问题。

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