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Phase-change memory devices with stacked Ge-chalcogenide/Sn-chalcogenide layers

机译:具有堆叠的锗硫属化物/锡硫属化物层的相变存储器件

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摘要

Non-volatile memory devices with two stacked layers of chalcogenide materials comprising the active memory device have been investigated for their potential as phase-change memories. The devices tested consisted of GeTe/SnTe, Ge_2Se_3/SnTe, and Ge_2Se_3/SnSe stacks. All devices exhibited resistance switching behavior. The polarity of the applied voltage with respect to the SnTe or SnSe layer was critical to the memory switching properties, most likely due to the voltage induced movement of either Sn or Te into the Ge-chalcogenide layer.
机译:已经研究了具有包括有源存储器件的硫属化物材料的两个堆叠层的非易失性存储器件作为相变存储器的潜力。测试的设备包括GeTe / SnTe,Ge_2Se_3 / SnTe和Ge_2Se_3 / SnSe堆栈。所有器件均表现出电阻切换行为。相对于SnTe或SnSe层施加的电压的极性对于存储器开关性能至关重要,这很可能是由于电压引起的Sn或Te到Ge硫族化物层中的运动。

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