High rotational symmetry photonic structures fabricated with multiple exposure Displacement Talbot Lithography

摘要

Quasi-periodic structures with a high degree of rotational symmetry are desired for photonic applications because of their nearly isotropic optical response, in contrast to the highly directional behavior of periodic lattices. Here we introduce a method based on the superposition of periodic structures obtained by multiple exposure of a photomask with Displacement Talbot Lithography in which the photomask is rotated by a certain angle between exposures. The resulting structure can be considered as a Moire pattern. High-quality patterns with 10 and 12 fold rotation symmetries and resolutions in the sub-micron to micron range are uniformly and reproducibly printed. The technique is suitable for the mass fabrication of wafer-scale quasi-periodic photonic patterns. (C) 2017 Elsevier B.V. All rights reserved.