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Investigating a new generation of ESD- induced reticle defects

机译:研究新一代ESD引起的掩模版缺陷

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摘要

New types of static-related reticle damage have been found in 0.25 μm and below production lines. Static-charge problems are well known in semiconductor manufacturing and other high-technology industries. Electrostatic attraction (ESA) increases the deposition of particles onto product surfaces and causes product breakage through the undesirable movement or sticking of products in equipment. Electrostatic discharge (ESD) damages products directly by vaporizing small component features. ESD also interferes with the operation of production equipment, particularly microprocessor-based robotics.
机译:在0.25μm及以下生产线中发现了新型的与静电有关的掩模版损坏。静电荷问题在半导体制造和其他高科技行业中众所周知。静电吸引(ESA)会增加颗粒在产品表面上的沉积,并由于产品在设备中的不良移动或粘附而导致产品损坏。静电放电(ESD)通过汽化小部件特征直接损坏产品。 ESD还会干扰生产设备的运行,尤其是基于微处理器的机器人。

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