The Swedish manufacturer of an EUV light source has set its sites on selling the system to major stepper manufacturers for use in next-generation lithography tools. Stockholm-based Innolite says ASML, Canon, and Nikon have shown keen interest in the company's plasma light source. The source operates at 13.5 nm, and its cryogenic liquid jet xenon technology is designed to minimize damage to the precision optics caused by nozzle erosion and debris, according to Innolite. The company points to efforts led by Intel and others to develop EUV lithography for chips with 70-nm features and smaller. Innolite claims its source is perfectly suited for this purpose. The technology was developed by Professor Hans Hertz and colleagues in the Department of Physics at the Royal Institute of Technology, Stockholm. Hertz cofounded the company in 2000 with backing from Itact, a Swedish venture capital firm.
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