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Growth mechanisms of ceria- and zirconia-based epitaxial thin films and hetero-structures grown by pulsed laser deposition

机译:二氧化铈和氧化锆基外延薄膜的生长机理以及脉冲激光沉积生长的异质结构

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摘要

Thin films and epitaxial hetero-structures of doped and undoped CeO2, and 8mol% Y2O3 stabilized ZrO2 (YSZ), were fabricated by pulsed laser deposition on different single crystal substrates. Reflection high energy electron diffraction was used to monitor in situ the growth mechanism of the films. Two distinct growth mechanisms were identified along the (001) growth direction for the Ce- and Zr-based materials, respectively. While the doped or undoped ceria films showed a 3-dimensional growth mechanism typically characterized by a pronounced surface roughness, YSZ films showed an almost ideal layer-by-layer 2-dimensional growth. Moreover, when the two materials were stacked together in epitaxial hetero-structures, the two different growth mechanisms were preserved. As a result, a 2-dimensional reconstruction of the ceria-based layers determined by the YSZ film growing above was observed. The experimental results are explained in terms of the thermodynamic stability of the low-index surfaces of the two materials using computational analysis performed by density functional theory.
机译:通过在不同的单晶衬底上脉冲激光沉积,制备了掺杂和未掺杂的CeO2以及8mol%的Y2O3稳定的ZrO2(YSZ)的薄膜和外延异质结构。反射高能电子衍射用于原位监测薄膜的生长机理。对于基于Ce和Zr的材料,分别沿(001)生长方向确定了两种不同的生长机理。尽管掺杂或未掺杂的二氧化铈膜表现出通常以明显的表面粗糙度为特征的3维生长机理,但YSZ膜却表现出几乎理想的逐层2维生长。此外,当两种材料以外延异质结构堆叠在一起时,保留了两种不同的生长机制。结果,观察到由以上生长的YSZ膜确定的基于二氧化铈的层的二维重构。通过使用密度泛函理论进行的计算分析,根据两种材料的低折射率表面的热力学稳定性解释了实验结果。

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