Three-dimensional patterning using fine step motion in synchrotron radiation lithography

摘要

A simple method of fabricating blazed diffraction gratings using synchrotron radiation lithography was developed that employs, an ordinary binary mask with a line-and-space pattern, a step-and-expose procedure that provides a linear cumulative-dose distribution, and a thick resist with a linear sensitivity curve. This method enables the fabrication of blazed gratings with a grating pitch of 1 mu m and a blaze angle of 15 degrees-40 degrees. The angle and pitch can be changed by changing the dose from step to step and/or by using mask spaces of different widths. (c) 2006 American Vacuum Society.