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Dynamic instabilities in {1 1 1} silicon

机译:{1 1 1}硅中的动态不稳定性

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The phenomena occurring during rapid crack propagation in brittle single crystals was studied by cleaving strip-like silicon specimens along the {111} low-energy cleavage plane under bending. The experiments reveal phenomena associated with rapid crack propagation in brittle single crystals not previously reported, and new crack path instabilities in particular. In contrast to amorphous materials, the observed instabilities are generated at relatively low velocity, while at high velocity the crack path remains stable. The experiments demonstrate that crack velocity in single crystals can attain the theoretical limit. No evidence for mirror, mist, and hackle instabilities, typical in amorphous materials, was found. The important role played by the atomistic symmetry of the crystals on controlling and generating the surface instabilities is explained; the importance of the velocity and orientation-dependent cleavage energy is discussed. The surface instabilities are generated to satisfy minimum energy dissipation considerations. These findings necessitate a new approach to the fundamentals of dynamic crack propagation in brittle single crystals.
机译:通过在弯曲下沿着{111}低能分裂平面切割条状硅试样,研究了脆性单晶在快速裂纹扩展过程中发生的现象。实验揭示了与以前没有报道的脆性单晶中快速裂纹扩展有关的现象,特别是新的裂纹路径不稳定性。与无定形材料相反,观察到的不稳定性是在相对较低的速度下产生的,而在较高的速度下,裂纹路径保持稳定。实验表明,单晶裂纹速度可以达到理论极限。没有发现无定形材料中常见的镜面,雾状和光晕不稳定性的证据。解释了晶体的原子对称性在控制和产生表面不稳定性中的重要作用;讨论了速度和取向相关的裂解能的重要性。产生表面不稳定性以满足最小的能量消耗考虑。这些发现需要一种新方法来研究脆性单晶中动态裂纹扩展的基础。

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