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Dark Subgap States in Metal-Halide Perovskites Revealed by Coherent Multidimensional Spectroscopy

机译:相干多维光谱揭示金属卤化物钙钛矿中的黑暗亚带隙状态。

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摘要

Metal-halide perovskites show excellent properties for photovoltaic and optoelectronic applications, with power conversion efficiencies of solar cell and LEDs exceeding 20%. Being solution processed, these polycrystalline materials likely contain a large density of defects compared to melt-grown semiconductors. Surprisingly, typical effects from defects (absorption below the bandgap, low fill factor and open circuit voltage in devices, strong nonradiative recombination) are not observed. In this work, we study thin films of metal-halide perovskites CH_3NH_3PbX_3 (X = Br, I) with ultrafast multidimensional optical spectroscopy to resolve the dynamics of band and defect states. We observe a shared ground state between the band-edge transitions and a continuum of sub-bandgap states, which extends at least 350 meV below the band edge). We explain the comparatively large bleaching of the dark sub-bandgap states with oscillator strength borrowing from the band-edge transition. Our results show that upon valence to conduction band excitation, such subgap states are instantaneously bleached for large parts of the carrier lifetime and conversely that most dark sub-bandgap states can be populated by light excitation. This observation helps to unravel the photophysical origin of the unexpected optoelectronic properties of these materials.
机译:金属卤化物钙钛矿对光伏和光电应用显示出优异的性能,太阳能电池和LED的功率转换效率超过20%。经过固溶处理后,与熔融生长的半导体相比,这些多晶材料可能包含较大密度的缺陷。出乎意料的是,未观察到缺陷的典型影响(在带隙以下吸收,器件中的低填充因子和开路电压,强烈的非辐射复合)。在这项工作中,我们用超快速多维光谱研究了金属卤化物钙钛矿CH_3NH_3PbX_3(X = Br,I)的薄膜,以解决能带和缺陷态的动力学问题。我们观察到在带边跃迁和子带隙状态的连续体之间有一个共享的基态,它在带边以下至少延伸了350 meV。我们解释了在子带隙较暗的状态下相对较大的漂白现象,其中振荡器强度是从带边跃迁中借用的。我们的结果表明,在达到导带激发的化合价时,这种子隙态会在大部分载流子寿命中瞬间被漂白,反之,大多数暗子带隙态可以通过光激发来填充。这种观察有助于揭示这些材料意想不到的光电特性的光物理起源。

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  • 来源
    《Journal of the American Chemical Society》 |2020年第2期|777-782|共6页
  • 作者单位

    IFN-CNR Dipartimento di Fisica Politecnico di Milano Piazza L. da Vinci 32 20133 Milano Italy;

    IFN-CNR Dipartimento di Fisica Politecnico di Milano Piazza L. da Vinci 32 20133 Milano Italy Department of Chemistry and Materials Technology Kyoto Institute of Technology 606-8585 Kyoto Japan;

    Cavendish Laboratory University of Cambridge JJ Thomson Avenue Cambridge CB3 0HE United Kingdom;

    Cavendish Laboratory University of Cambridge JJ Thomson Avenue Cambridge CB3 0HE United Kingdom Walter Schottky Institut and Physik Department Technische Universitaet Muenchen 85748 Garching Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
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  • 正文语种 eng
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