首页> 外文期刊>Journal of the American Chemical Society >Highly Stable Organic Monolayers for Reacting Silicon with Further Functionalities: The Effect of the C-C Bond nearest the Silicon Surface
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Highly Stable Organic Monolayers for Reacting Silicon with Further Functionalities: The Effect of the C-C Bond nearest the Silicon Surface

机译:高度稳定的有机单层膜,可与其他功能的硅反应:最接近硅表面的C-C键的作用

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摘要

Crystalline Si(111) surfaces have been alkylated in a two-step chlorination/alkylation process using various organic molecules having similar backbones but differing in their C-C bond closest to the silicon surface (i.e., C-C vs C=C vs C≡C bonds). X-ray photoelectron spectroscopic (XPS) data show that functionalization of silicon surfaces with propenyl magnesium bromide (CH_3-CH=CH-MgBr) organic molecules gives nearly full coverage of the silicon atop sites, as on methyl- and propynyl-terminated silicon surfaces. Propenyl-terminated silicon surface shows less surface oxidation and is more robust against solvent attacks when compared to methyl- and propynyl-terminated silicon surfaces. We also show a secondary functionalization process of propenyl-terminated silicon surface with 4'-[3-Trifluoromethyl-3H-diazirin-3-yl]-benzoic acid N-hydroxysuccinimide ester [TDBA-OSu] cross-linker. The Si-CH=CH-CH_3 surfaces thus offer a means of attaching a variety of chemical moieties to a silicon surface through a short linking group, enabling applications in molecular electronics, energy conversion, catalysis, and sensing.
机译:使用具有相似主链但最接近硅表面的CC键不同的各种有机分子,在两步氯化/烷基化过程中已将结晶的Si(111)表面烷基化(即,CC对C = C对C≡C键) 。 X射线光电子能谱(XPS)数据表明,用丙烯基溴化镁(CH_3-CH = CH-MgBr)有机分子对硅表面进行官能化处理,几乎可以完全覆盖硅的顶部,如甲基和丙炔基封端的硅表面。与甲基和丙炔基封端的硅表面相比,丙烯基封端的硅表面显示较少的表面氧化,并且对溶剂的侵害更牢固。我们还显示了带有4'-[3-三氟甲基-3H-二氮杂-3-基]-苯甲酸N-羟基琥珀酰亚胺酯[TDBA-OSu]交联剂的丙烯封端的硅表面的二次官能化过程。因此,Si-CH = CH-CH_3表面提供了一种通过短连接基团将各种化学部分连接到硅表面的方法,从而可以应用于分子电子学,能量转换,催化和传感。

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