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Production of capacitive films from Mn thin films: Effects of current density and film thickness

机译:由Mn薄膜生产电容性薄膜:电流密度和薄膜厚度的影响

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摘要

Electrochemical oxidation of Mn thin films produces a highly capacitive, porous MnO_2 surface layer. The effects of current density and deposited Mn layer thickness on the morphology of the porous surface layer are quite pronounced. A higher current density results in a much thinner, finer porous layer while thicker deposited Mn films give much thicker porous films. Increasing the current density results in a film with greater hydration and an increase in capacitance. For the films of varying deposited layer thickness, oxidation occurs at a single current density and, as a result, the relative hydration of the film does not change noticeably. Increasing the deposited layer thickness results in a porous surface layer that increases in thickness, but with a constant amount of hydration. This combination of trends results in a significant increase in the areal capacitance of the film but little change in the specific capacitance.
机译:Mn薄膜的电化学氧化产生了高电容性的多孔MnO_2表面层。电流密度和沉积的Mn层厚度对多孔表面层形态的影响非常明显。较高的电流密度导致多孔层更薄,更细,而沉积的Mn膜较厚则多孔膜更厚。电流密度的增加导致膜具有更大的水合作用和电容的增加。对于沉积层厚度不同的薄膜,在单一电流密度下会发生氧化,结果,薄膜的相对水合作用不会发生明显变化。沉积层厚度的增加导致多孔表面层的厚度增加,但是水合量恒定。这种趋势的组合导致膜的面积电容显着增加,但是比电容几乎没有变化。

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