...
首页> 外文期刊>Journal of power sources >Ultra-high energy density thin-film capacitors with high power density using BaSn_(0.15)Ti_(0.85)O_3/Ba_(0.6)Sr_(0.4)TiO_3 heterostructure thin films
【24h】

Ultra-high energy density thin-film capacitors with high power density using BaSn_(0.15)Ti_(0.85)O_3/Ba_(0.6)Sr_(0.4)TiO_3 heterostructure thin films

机译:使用BaSn_(0.15)Ti_(0.85)O_3 / Ba_(0.6)Sr_(0.4)TiO_3异质结构薄膜的高功率密度超高能量密度薄膜电容器

获取原文
获取原文并翻译 | 示例
           

摘要

Ultra-high energy storage performance of lead-free ferroelectric materials has been achieved at room temperature by heterostructure composite based on environment-friendly BaSn0.15Ti0.85O3 and Ba0.6Sr0.4TiO3 thin films. The dielectric constant and loss tangent of BaSn0.15Ti0.85O3 layers grown on the Ba0.6Sr0.4TiO3 layers respectively are calculated as 402 and 0.0137 at 100 kHz. The interfacial layer between Ba0.6Sr0.4TiO3 and Ba0.6Sr0.4TiO3 layers can improve the dielectric constant and reduce the loss tangent of heterostructures. The electrical breakdown strength can be significantly enhanced by the interfacial layer, and the influence mechanism is proposed. Ultra-high energy storage density as high as 43.28 J/cm(3), is obtained at a sustained high bias electric field of 2.37 MV/cm with a power density of 6.47 MW/cm(3) and an efficiency of 84.91% in the BaSn0.15Ti0.85O3/Ba0.6Sr0.4TiO3 heterostructure thin films.
机译:通过基于环保的BaSn0.15Ti0.85O3和Ba0.6Sr0.4TiO3薄膜的异质结构复合材料,在室温下实现了无铅铁电材料的超高储能性能。在100 kHz下,分别生长在Ba0.6Sr0.4TiO3层上的BaSn0.15Ti0.85O3层的介电常数和损耗角正切计算为402和0.0137。 Ba0.6Sr0.4TiO3和Ba0.6Sr0.4TiO3层之间的界面层可以提高介电常数并减少异质结构的损耗角正切。通过界面层可以显着提高电击穿强度,并提出了影响机理。在2.37 MV / cm的持续高偏置电场,6.47 MW / cm(3)的功率密度和84.91%的效率下,可获得高达43.28 J / cm(3)的超高能量存储密度。 BaSn0.15Ti0.85O3 / Ba0.6Sr0.4TiO3异质结构薄膜。

著录项

  • 来源
    《Journal of power sources》 |2019年第1期|648-654|共7页
  • 作者单位

    Tianjin Univ, Sch Microelect, Tianjin 300072, Peoples R China|Tianjin Univ, Key Lab Adv Ceram & Machining Technol, Tianjin 300072, Peoples R China;

    Tianjin Univ, Sch Microelect, Tianjin 300072, Peoples R China|Tianjin Univ, Key Lab Adv Ceram & Machining Technol, Tianjin 300072, Peoples R China;

    Dongguan Univ Technol, Sch Elect Engn & Intelligentizat, Dongguan 523808, Guangdong, Peoples R China;

    North Univ China, Sch Instrument & Elect, Taiyuan 030051, Peoples R China;

    Tianjin Univ, Sch Microelect, Tianjin 300072, Peoples R China|Tianjin Univ, Key Lab Adv Ceram & Machining Technol, Tianjin 300072, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Energy density; Power density; Dielectric constant; Thin films;

    机译:能量密度;功率密度;介电常数;薄膜;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号