机译:射频功率对射频磁控溅射铋镁铌钛钛薄膜介电性能的影响
Department of Electronic and Information Engineering, Tianjin University, 92 Weijin Road, Tianjin 300072, People's Republic of China;
Department of Electronic and Information Engineering, Tianjin University, 92 Weijin Road, Tianjin 300072, People's Republic of China;
Department of Electronic and Information Engineering, Tianjin University, 92 Weijin Road, Tianjin 300072, People's Republic of China;
Department of Electronic and Information Engineering, Tianjin University, 92 Weijin Road, Tianjin 300072, People's Republic of China;
Department of Electronic and Information Engineering, Tianjin University, 92 Weijin Road, Tianjin 300072, People's Republic of China;
Department of Electronic and Information Engineering, Tianjin University, 92 Weijin Road, Tianjin 300072, People's Republic of China;
机译:沉积压力对射频磁控溅射铋镁铌钛钛薄膜介电性能的影响
机译:厚度对射频磁控溅射铋镁铌薄膜介电性能的影响
机译:厚度对RF磁控溅射沉积的镁镁铌薄膜介电性能的影响
机译:O_2 / AR对RF磁控溅射制备的铋锌铌酸盐钛薄膜介电性能的影响
机译:射频磁控溅射沉积的氧化钇稳定的氧化锆薄膜的结构和材料性能评估。
机译:直流磁控溅射沉积TiO2薄膜的生物相容性和表面性质
机译:通过射频磁控溅射沉积的Pb (Zr,Sn)Ti NbO3膜的结构和介电性能