机译:沉积温度对TiO_2薄膜光学,结构,形态,组成和光电化学性质的影响
Materials Research Laboratory, Department of Chemistry, Shivaji University, Kolhapur 416004, India;
School of Applied Chemical Engineering, Chonnam National University, Gwangju 500-757, South Korea;
Materials Research Laboratory, Department of Chemistry, Shivaji University, Kolhapur 416004, India;
Materials Research Laboratory, Department of Chemistry, Shivaji University, Kolhapur 416004, India;
School of Applied Chemical Engineering, Chonnam National University, Gwangju 500-757, South Korea;
Materials Research Laboratory, Department of Chemistry, Shivaji University, Kolhapur 416004, India;
机译:镀液温度,沉积时间和S / Cd比对化学镀液制备的CdS薄膜结构,表面形貌,化学组成和光学性能的影响
机译:退火温度对纳米TiO_2薄膜结构,形貌和光学性质的影响
机译:通过化学浴沉积制备的Cu_7S_4薄膜结构,形态,光学和电性能的影响
机译:ZnO:XN薄薄膜通过化学喷雾沉积。沉积温度对电,光学,结构和形态特性的影响
机译:可溶液处理的半导体薄膜:形态,结构,光学和电荷传输性质之间的相关性
机译:电泳沉积技术合成的TiO2薄膜的结构形态和光学性质
机译:镀液温度,沉积时间和S / Cd比对化学镀液制备的CdS薄膜结构,表面形貌,化学组成和光学性能的影响