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首页> 外文期刊>Journal of Manufacturing Processes >Chemo-mechanical abrasive flow machining (CM-AFM): A novel high-efficient technique for polishing diamond thin coatings on inner hole surfaces
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Chemo-mechanical abrasive flow machining (CM-AFM): A novel high-efficient technique for polishing diamond thin coatings on inner hole surfaces

机译:化学机械磨料流量加工(CM-AFM):一种新型高效技术,用于在内孔表面上抛光金刚石薄涂层

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摘要

The abrasive flow machining (AFM) technique is suitable for polishing thin coatings on inner hole or complicated surfaces, but the efficiency for machining ultrahard materials is rather low. In the present research, a novel technology named chemo-mechanical AFM (CM-AFM) is proposed, combining the abrasive flow-mechanical action and chemical (oxidation) reaction. The CM-AFM operational route is determined, based on which an application case for polishing the inner hole surface of the diamond coated wire drawing die is shown. Due to the synergistic mechanism of the chemo-mechanical actions, the CM-AFM indeed presents much higher polishing capability and efficiency than the conventional AFM. Especially for partly-smoothened diamond surfaces the can hardly be further polished by AFM (with a limit of Ra value of about 140 nm), the introduction of chemical reaction makes further polishing feasible, and much lower final surface roughness (Ra 45 nm) is achieved. Moreover, influences of the critical factors, i.e., the diamond film type (micro- or nano-sized), the zone and aperture of the inner hole, pressure, combination of the temperature and media type, along with the volume and frequency of oxidizing agent injection, are systematically studied. It is believed that such a technique also has great potentials for polishing similar ultrahard complicated surfaces, especially thin coatings with limited machining allowances and adhesion.
机译:磨料流动加工(AFM)技术适用于抛光薄涂层在内孔或复杂的表面上,但加工超硬材料的效率相当低。在本研究中,提出了一种名为Chemo-Machery AFM(CM-AFM)的新技术,组合磨料流动 - 机械作用和化学(氧化)反应。确定CM-AFM运行路线,基于该施加用于抛光金刚石涂覆的线材拉丝模具的内孔表面的应用壳体。由于化疗动作的协同机制,CM-AFM确实具有比传统AFM更高的抛光能力和效率。特别是对于部分平滑的金刚石表面,通过AFM几乎无法进一步抛光(具有约140nm的Ra值限制),化学反应的引入进行了进一步的抛光可行,并且最终表面粗糙度(Ra 45nm)是更低的实现。此外,临界因素的影响,即金刚石膜型(微型或纳米或纳米或纳米或纳米尺寸),区域和孔径的孔,压力,介质类型的组合以及氧化的体积和频率药剂注射,被系统地研究。据信,这种技术还具有巨大的潜力,用于抛光类似的超硬复杂表面,特别是具有有限的加工余量和粘合性的薄涂层。

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