首页> 外文期刊>Journal of information and optimization sciences >Some topological indices for Silicon-Carbon Si_2C_3 - I[p,q] and some inequalities between distance-based and degree-based indices in Silicon-Carbon Si_2C_3 - I[p, q]
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Some topological indices for Silicon-Carbon Si_2C_3 - I[p,q] and some inequalities between distance-based and degree-based indices in Silicon-Carbon Si_2C_3 - I[p, q]

机译:硅 - 碳Si_2c_3 - i [p,q]的一些拓扑指标以及硅 - 碳Si_2c_3中距离和基于程度的索引之间的一些不等式 - i [p,q]

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摘要

Using inequalities is a good way of studying topological indices. Chemical graph theory is one of the nontrivial applications of graph theory. Silicon-Carbon bonds (si(2)c(3) -I[p,q]) are one of the most important compounds in chemistry. Since calculating distance-based indices for Silicon-Carbon (si(2)c(3)-I[p,q]) is not easily computable, this paper seeks to apply inequalities to determine the relationship between some degree-based indices and distance-based indices.
机译:使用不平等是研究拓扑指数的好方法。 化学图理论是图论的非竞争应用之一。 硅碳键(Si(2)C(3)-I [P,Q])是化学中最重要的化合物之一。 由于计算硅 - 碳的基于距离的索引(Si(2)C(3)-I [P,Q]),因此本文寻求申请不平等来确定基于程度的指数与距离之间的关系 基于指数。

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