Treating disinfection byproducts with UV or solar irradiation and in UV advanced oxidation processes: A review

摘要

This review focuses on the degradation kinetics and mechanisms of disinfection byproducts (DBPs) under UV and solar irradiation and in UV-based advanced oxidation processes (AOPs). A total of 59 such compounds are discussed. The processes evaluated are low pressure, medium pressure and vacuum UV irradiation, solar irradiation together with UV/hydrogen peroxide, UV/persulfate and UV/chlorine AOPs. Under UV and solar irradiation, the photodegradation rates of N-nitrosamines are much higher than those of halogenated DBPs. Among halogenated DBPs, those containing iodine are photodegraded more rapidly than those containing bromine or chlorine. This is due to differences in their bond energies (EN-N EC-I EC-Br EC-Cl). Molar absorption coefficients at 254 nm and energy gaps can be used to predict the photodegradation rates of DBPs under low pressure UV irradiation. But many DBPs of interest cannot be degraded to half their original concentration with less than a 500 mJ cm(-2) dose of low pressure UV light. HO center dot generally contributes to less than 30% of the degradation of DBPs except iodo-DBPs in UV/H2O2 AOPs. Reaction mechanisms under UV irradiation and in HO center dot-mediated oxidation are also summarized. N-N bond cleavage initiates their direct UV photolysis of N-nitrosamines as C-X cleavage does among halogenated compounds. HO center dot generally initiates degradation via single electron transfer, addition and hydrogen abstraction pathways. Information on the reaction rate constants of SO4 center dot- and halogen radicals with DBPs is rather limited, and little information is available about their reaction pathways. Overall, this review provides improved understanding of UV, solar and AOPs.