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Galvanic Electrodeposition of Thick Tungsten Coatings on CuCrZr Alloy

机译:CuCrZr合金上厚钨涂层的电沉积

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摘要

The tungsten coatings were prepared on CuCrZr alloy substrate by galvanostatic electrolysis in Na2WO4-WO3 molten salt with duration from 1.5 to 30 h. The effects of electrodeposition duration on the morphology and microstructure of the coatings were investigated in this paper. Pure and compact tungsten coatings were successfully obtained with columnar structure. The results demonstrated that with the duration increasing, the grain size and thickness of tungsten coatings increased while the (200) favored orientation dot not changed. However, the surface of tungsten coatings became no uniform and the current efficiency was decreased. The Vickers micro-hardness and oxygen content of tungsten coatings were decreased with the duration increasing.
机译:通过在Na2WO4-WO3熔融盐中进行恒流电解,在CuCrZr合金基底上制备钨涂层,时间为1.5至30 h。研究了电沉积持续时间对涂层形态和微观结构的影响。成功获得了具有柱状结构的纯致密钨涂层。结果表明,随着时间的延长,钨涂层的晶粒尺寸和厚度增加,而(200)择优取向点不变。然而,钨涂层的表面变得不均匀并且电流效率降低。钨涂层的维氏显微硬度和氧含量随时间的延长而降低。

著录项

  • 来源
    《Journal of Fusion Energy》 |2016年第2期|281-288|共8页
  • 作者

    Jiang Fan; Zhang Yun;

  • 作者单位

    Nanjing Univ Informat Sci & Technol, Sch Phys & Optoelect Engn, Dept Mat & Phys, 219 Ningliu Rd, Nanjing 210044, Jiangsu, Peoples R China|Univ Sci & Technol Beijing, Sch Mat Sci & Engn, 30 Xueyuan Rd, Beijing 10083, Peoples R China;

    Univ Sci & Technol Beijing, Sch Mat Sci & Engn, 30 Xueyuan Rd, Beijing 10083, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Tungsten coating; Electrodeposition; Molten salt; Microstructure;

    机译:钨涂层;电沉积;熔盐;显微组织;

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