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首页> 外文期刊>Journal of Crystal Growth >(1 1 1)B growth elimination in GaAs MBE of (0 0 1)-(1 1 1)B mesa structure by suppressing 2D-nucleation
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(1 1 1)B growth elimination in GaAs MBE of (0 0 1)-(1 1 1)B mesa structure by suppressing 2D-nucleation

机译:通过抑制2D成核作用消除(0 0 1)-(1 1 1)B台面结构的GaAs MBE中的(1 1 1)B生长

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摘要

MBE growth of GaAs mesa structure consisting of (0 0 1) top and (1 1 1)B side surfaces was studied and the ratio of growth rate on (1 1 1)B facet to that on (0 0 1) was measured in various growth conditions. The value changed drastically, from 0 to 0.8, depending on the growth conditions. It was found that complete growth elimination occurred on (1 l 1)B facet by decreasing incident Ga flux and suppressing 2D-nucleation. We obtained various information from these experiments about elementary process of GaAs MBE, including critical Ga adatom concentration for 2D-nucleation on (1 1 1)B surface and (1 1 1)B-(0 0 1) inter-surface diffusion.
机译:研究了由(0 0 1)顶部和(1 1 1)B侧面组成的GaAs台面结构的MBE生长,并测量了(1 1 1)B刻面与(0 0 1)上的生长速率之比。各种生长条件。取决于生长条件,该值从0到0.8急剧变化。发现通过减少入射Ga的通量并抑制2D成核作用,在(1 l 1)B面上发生了完全的生长消除。我们从这些实验中获得了有关GaAs MBE基本过程的各种信息,包括在(1 1 1)B表面进行2D成核和(1 1 1)B-(0 0 1)表面扩散的临界Ga原子浓度。

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