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首页> 外文期刊>Journal of Crystal Growth >A new double crucible technique for LEC growth of In-doped GaAs crystals
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A new double crucible technique for LEC growth of In-doped GaAs crystals

机译:In掺杂GaAs晶体LEC生长的新双坩埚技术

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A new double crucible technique was used in the liquid-encapsulated Czochralski (LEC) growth of In-doped GaAs to grow single crystals homogeneous in composition (0.04 and 0.1 mol% InAs). The inner crucible holding the melt for crystal growth was slightly smaller in diameter than the outer crucible holding the melt for replenishing. Unlike in previous studies, the replenishing melt did not have to go through a hole or tube at the bottom of the inner crucible, which can be plugged by the liquid encapsulant B_2O_3 during crystal growth. Rather, the replenishing melt was forced to go up through the narrow gap between the crucibles and enter the inner crucible from the top. Initially, a ring-shaped baffle was provided at the top of the inner crucible to make the replenishing melt mix well with the growth melt as it entered the inner crucible. Later, however, such a baffle was found unnecessary. Single crystals were grown with uniform InAs concentrations both in the axial and radial directions, without as well as with a baffle.
机译:一种新的双坩埚技术用于In掺杂GaAs的液体封装Czochralski(LEC)生长中,以生长组成均一(0.04和0.1 mol%InAs)的单晶。容纳用于晶体生长的熔体的内坩埚的直径略小于容纳用于补充的熔体的外坩埚的直径。与以前的研究不同,补充的熔体不必穿过内坩埚底部的孔或管,在晶体生长过程中,其可以被液体密封剂B_2O_3堵塞。而是,补充熔体被迫通过坩埚之间的狭窄缝隙,并从顶部进入内部坩埚。最初,在内部坩埚的顶部提供了一个环形挡板,以使补充熔体与生长熔体进入内部坩埚时能够很好地混合。然而,后来发现这种挡板是不必要的。在轴向和径向方向上均以均匀的InAs浓度生长单晶,没有挡板也没有挡板。

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