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首页> 外文期刊>Journal of Computational Electronics >Theoretical investigation of the charges weight between interface and the oxygen traps in barrier layer on the 2DEG density of AI_2O_3/AIGaN/GaN HEMTs
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Theoretical investigation of the charges weight between interface and the oxygen traps in barrier layer on the 2DEG density of AI_2O_3/AIGaN/GaN HEMTs

机译:AI_2O_3 / AIGaN / GaN HEMT的2DEG密度对界面和势垒层中氧陷阱之间电荷权重的理论研究

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摘要

Unintentional impurities like oxygen introduced into the undoped AlGaN barrier may present an important traps source for these devices besides /AlGaN interface traps. Here, we present a theoretical study of the charges weight between oxygen traps in barrier layer and /AlGaN interface traps on the 2DEG density for different gate bias. In order to conduct this study, a semi-analytical 1D charge model has been developed and used based on the nonlinear Poisson and Schrodinger coupled equations. The model is based on a new analytical expression of the electric field distribution under the gate including the ionized oxygen profile into the AlGaN barrier. A secondary ion mass spectrometry and deep-level transient spectroscopy measurements on a fabricated device were performed. A mean density of oxygen up to was measured into the AlGaN barrier, associated with an activation energy of 0.44 eV and a cross section of 1.4 . Using these values as the model inputs, the theoretical results showed that even with changing the balance between the interface states density and the barrier traps density, there is no an absolute traps domination either from the barrier or the interface traps and their impact weight on the 2DEG density changes with the gate bias.
机译:除/ AlGaN界面陷阱外,无意引入的杂质(如引入到未掺杂的AlGaN势垒中的氧气)可能是这些器件的重要陷阱源。在这里,我们针对不同的栅极偏压,针对2DEG密度对势垒层中的氧陷阱与/ AlGaN界面陷阱之间的电荷权重进行了理论研究。为了进行这项研究,基于非线性泊松和薛定inger耦合方程,开发并使用了半解析一维电荷模型。该模型基于栅极下电场分布的新分析表达式,其中包括进入AlGaN势垒的电离氧分布。在制造的设备上进行了二次离子质谱和深层瞬态光谱测量。测量到AlGaN势垒的氧气的平均密度,直至0.44 eV的活化能和1.4的横截面。使用这些值作为模型输入,理论结果表明,即使改变界面态密度和势垒陷阱密度之间的平衡,也没有绝对势垒占主导地位,无论是势垒还是界面陷阱及其对硅的影响权重。 2DEG密度随栅极偏置而变化。

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