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首页> 外文期刊>Journal of Applied Physics >Thermal ionization induced metal-semiconductor transition and room temperature ferromagnetism in trivalent doped ZnO codoped with lithium
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Thermal ionization induced metal-semiconductor transition and room temperature ferromagnetism in trivalent doped ZnO codoped with lithium

机译:锂共掺杂三价掺杂ZnO中的热电离诱导的金属-半导体跃迁和室温铁磁性

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摘要

Thermal ionization induced metallic to semiconductor (MST) transition occurring at 460 K for Zn0.97Al0.03O, 463 K for Zn0.94Al0.03Li0.03O, and 503 K for Zn0.91Al0.03Li0.03Mn0.03O has been found in the sol-gel synthesized (using hexamethylenetetramine), trivalent doped (Al, Mn) ZnO codoped with lithium. Increase in the thermally ionized carrier concentration due to Al doping is responsible for near band edge (NBE) peak shift causing Fermi level to move into conduction band making it metallic consistent with resistivity results. Free carrier (thermally activated) neutralization with ionized donor is responsible for semiconducting nature, which is supported from the free carrier screening produced energy shift in the NBE of photoluminescence peak. Furthermore, independently band gap shrinkage is also obtained from UV-Visible studies confirming localization induced MST. An anti-correlation is found between defect density (DLE) and room temperature ferromagnetism (RTFM) indicating intrinsic defects are not directly responsible for RTFM.
机译:在锌中发现了热电离诱导的金属到半导体(MST)跃迁,发生在460 K的Zn0.97Al0.03O,463 K的Zn0.94Al0.03Li0.03O和503 K的Zn0.91Al0.03Li0.03Mn0.03O。溶胶-凝胶法合成(使用六亚甲基四胺),锂共掺杂的三价掺杂(Al,Mn)ZnO。 Al掺杂引起的热电离载流子浓度增加是造成近能带边缘(NBE)峰移动的原因,从而导致费米能级移入导带,从而使其金属化与电阻率结果一致。用电离供体中和自由载流子(热活化)是半导体的本质,这得益于自由载流子筛选在光致发光峰的NBE中产生的能量转移。此外,还从紫外可见研究中获得了独立的带隙收缩,证实了局部诱导的MST。在缺陷密度(DLE)和室温铁磁(RTFM)之间发现了反相关关系,表明固有缺陷并不直接导致RTFM。

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  • 来源
    《Journal of Applied Physics》 |2014年第9期|1-7|共7页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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