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首页> 外文期刊>Journal of Applied Physics >Effects of boron composition on tunneling magnetoresistance ratio and microstructure of CoFeB/MgO/CoFeB pseudo-spin-valve magnetic tunnel junctions
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Effects of boron composition on tunneling magnetoresistance ratio and microstructure of CoFeB/MgO/CoFeB pseudo-spin-valve magnetic tunnel junctions

机译:硼组成对CoFeB / MgO / CoFeB假自旋阀磁隧道结隧穿磁阻比和微观结构的影响

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摘要

The effect of B concentration on the tunneling magnetoresistance (TMR) of (Co_(25)Fe_(25))_(100-x) B_x/MgO/(Co)(25)Fe_(75))_(100-x)B_x (x = 22 and 33) pseudo-spin-valve (P-SV) magnetic tunnel junctions (MTJs) was investigated. The TMR ratios for optimally annealed MTJs with x = 22 and 33 were 340% and 170%, respectively, at room temperature. High resolution transmission electron microscopy (HRTEM) observation showed a weaker (001) texture in the MgO barrier in the MTJ with v=33. The bottom electrode was not fully crystallized even with a considerable amount of B in the (Co_(25)Fe_(75))_(67)B_(33), while good epitaxy was observed between (001) textured MgO and (Co_(25)Fe_(75))_(78)B_(22) electrodes.
机译:B浓度对(Co_(25)Fe_(25))_(100-x)B_x / MgO /(Co)(25)Fe_(75))_(100-x)的隧穿磁阻(TMR)的影响研究了B_x(x = 22和33)伪自旋阀(P-SV)磁性隧道结(MTJ)。 x = 22和33的最佳退火MTJ在室温下的TMR比分别为340%和170%。高分辨率透射电子显微镜(HRTEM)观察显示,v = 33,MTJ中的MgO势垒较弱(001)织构。底部电极即使(Co_(25)Fe_(75))_(67)B_(33)中含有大量的B也不能完全结晶,而在(001)织构的MgO和(Co_( 25)Fe_(75))_(78)B_(22)电极。

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  • 来源
    《Journal of Applied Physics》 |2012年第4期|p.043913.1-043913.3|共3页
  • 作者单位

    Graduate School of Pure and Applied Sciences, University of'Tsukuba, Tsukuha 305-0047, Japan;

    National Institute for Materials Science, Tsukuba 305-0047, Japan;

    Graduate School of Pure and Applied Sciences, University of'Tsukuba, Tsukuha 305-0047, Japan ,National Institute for Materials Science, Tsukuba 305-0047, Japan;

    Center for Spintronics Integrated Systems, Tohoku University, Sendai 980-8577, Japan,Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University, Sendai 980-8577, Japan;

    Center for Spintronics Integrated Systems, Tohoku University, Sendai 980-8577, Japan;

    Center for Spintronics Integrated Systems, Tohoku University, Sendai 980-8577, Japan,Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University, Sendai 980-8577, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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