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机译:脉冲等离子体化学气相沉积法从C_2H_2和H_2混合物制备类金刚石薄膜的结构和力学性能
Panasonic Electric Works Co., Ltd., Kadoma, Osaka 571-8686, Japan Department of Materials, Physics and Energy Engineering, Nagoya University, Nagoya 464-8603, Japan;
Department of Materials Science and Technology, Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan;
Department of Materials Science and Technology, Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan;
Department of Mechanical Sciences and Engineering, Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan;
rnDepartment of Materials, Physics and Energy Engineering, Nagoya University, Nagoya 464-8603, Japan;
机译:脉冲等离子体化学气相沉积法制备掺硅类金刚石碳膜的力学性能
机译:脉冲偏压对等离子体增强化学气相沉积法制备的硅/氮结合类金刚石碳膜结构和性能的影响
机译:脉冲偏压占空比对等离子增强化学气相沉积法制备的富勒烯纳米结构和氢化碳膜力学性能的影响
机译:垂直电容器电极通过等离子增强化学气相沉积制备的类金刚石碳膜的表征
机译:通过等离子体辅助化学气相沉积制备的类金刚石碳膜的热降解和摩擦学行为。
机译:脉冲等离子体化学气相沉积法制备纳米多孔非晶碳化硼薄膜的摩擦学和热稳定性研究
机译:通过不同激光强度脉冲激光沉积制备的金刚石状碳膜的结构和力学性能