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首页> 外文期刊>Japanese journal of applied physics >Crystal Growth of Indium-Doped Czochralski Silicon for Photovoltaic Application
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Crystal Growth of Indium-Doped Czochralski Silicon for Photovoltaic Application

机译:光伏应用中掺杂铟的直拉硅的晶体生长

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摘要

In this paper we have investigated the crystal growth of indium-doped Czochralski (CZ) silicon for photovoltaic application. It is found that during the CZ silicon crystal growth the evaporation of indium is rather severe, which makes the accurate control of desired resistivity in the crystal difficult. The rapid indium doping after melting raw poly-silicon materials has been proposed to reduce the indium evaporation. The segregation coefficient of indium in silicon has been verified to be 4.0 × 10~(-4) by the method of quenching the crystal growth. With an increase of doping concentration, the electrical activity of indium dopants in silicon is found to become smaller. Beyond a critical doping concentration, the cellular growth of indium-doped CZ silicon crystal generally occurs. These results are of interest for the application of indium-doped silicon solar cells without light-induced degradation in photovoltaics.
机译:在本文中,我们研究了用于光伏应用的掺铟Czochralski(CZ)硅的晶体生长。发现在CZ硅晶体生长期间,铟的蒸发相当严重,这使得难以精确控制晶体中所需的电阻率。已经提出了在熔化原始多晶硅材料之后快速铟掺杂以减少铟蒸发。通过猝灭晶体生长的方法已证实铟在硅中的偏析系数为4.0×10〜(-4)。随着掺杂浓度的增加,发现硅中铟掺杂剂的电活性变小。超过临界掺杂浓度,通常发生铟掺杂的CZ硅晶体的细胞生长。这些结果对于铟掺杂的硅太阳能电池的应用是令人感兴趣的,而光伏电池中没有光诱导的降解。

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  • 来源
    《Japanese journal of applied physics》 |2012年第10issue1期|105501.1-105501.4|共4页
  • 作者单位

    State Key Lab of Silicon Materials and Department of Material Science and Engineering, Zhejiang University, Hangzhou 310027, P. R. China;

    State Key Lab of Silicon Materials and Department of Material Science and Engineering, Zhejiang University, Hangzhou 310027, P. R. China;

    Faculty of Education, Shinshu University, Nagano 380-8544, Japan;

    State Key Lab of Silicon Materials and Department of Material Science and Engineering, Zhejiang University, Hangzhou 310027, P. R. China;

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