首页> 外文期刊>International Journal of Microwave and Wireless Technologies >A high-gain high-power amplifier MMIC for V-band applications using 100 nm AlGaN/ GaN dual-gate HEMTs
【24h】

A high-gain high-power amplifier MMIC for V-band applications using 100 nm AlGaN/ GaN dual-gate HEMTs

机译:使用100 nm AlGaN / GaN双栅极HEMT的V波段应用的高增益大功率放大器MMIC

获取原文
获取原文并翻译 | 示例
           

摘要

In this paper we present the design and realization of a high-power amplifier in grounded coplanar transmission line technology using AlGaN/GaN dual-gate High electron mobility transistors (HEMTs) with a gate-length of 100 nm to achieve a high gain per stage and high output power. A large-signal model was extracted for the dual-gate HEMT based on the state-space approach. For the fabricated dual-stage amplifier a continuous-wave saturatedoutput power of up to 24.8 dBm (0.84 W/mm) was measured at 63 GHz for 20 V drain bias. A small-signal gain of more than 20 dB was achieved between 56 and 65 GHz.
机译:在本文中,我们介绍了采用接地共面传输线技术的大功率放大器的设计和实现,该技术使用栅极长度为100 nm的AlGaN / GaN双栅极高电子迁移率晶体管(HEMT)来实现每级高增益和高输出功率。基于状态空间方法提取了双门HEMT的大信号模型。对于制造的双级放大器,在20 GHz漏极偏置下,在63 GHz下测得的连续波饱和输出功率高达24.8 dBm(0.84 W / mm)。在56至65 GHz之间实现了超过20 dB的小信号增益。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号