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首页> 外文期刊>International journal of hydrogen energy >Anodically potentiostatic deposition of flaky nickel oxide nanostructures and their electrochemical performances
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Anodically potentiostatic deposition of flaky nickel oxide nanostructures and their electrochemical performances

机译:片状氧化镍纳米结构的阳极电位沉积及其电化学性能

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摘要

Porous nickel oxide films composed of intercrossing nanoflakes are potentiostatically deposited onto the stainless steel substrate by a plating bath of sodium acetate, nickel sulfate and sodium sulfate. Deposition potential influences pore size of the deposited films. Pore size decreases as the deposition potential increases. Electrochemical performance of the deposited films is characterized by cyclic voltammogram. Specific capacity of the film deposited at 0.9 V is higher than that deposited at 1.05 V because bigger pores facilitate electrolyte penetration. A film with bigger pores deposited at low potential also provides superior performances in cycle-life stability and high-rate capability. The configuration of intercrossing nanoflake provides much more paths for electron conduction, and the flake-like structure shortens proton diffusion paths within the bulk of solid nickel oxide. In addition, a porous film with bigger pores benefits electrolyte penetration and provides larger surface area for charge-transfer reactions.
机译:通过乙酸钠,硫酸镍和硫酸钠的镀浴将由交叉的纳米薄片组成的多孔氧化镍膜恒电位沉积在不锈钢基材上。沉积电势会影响沉积膜的孔径。孔尺寸随着沉积电位的增加而减小。沉积膜的电化学性能通过循环伏安图表征。在0.9 V时沉积的薄膜的比容量比在1.05 V时沉积的薄膜的比容量更高,因为更大的孔有助于电解质渗透。在低电势下沉积具有较大孔的膜在循环寿命稳定性和高倍率性能方面也具有出色的性能。交叉纳米薄片的构型为电子传导提供了更多的路径,并且薄片状结构缩短了固体氧化镍主体中的质子扩散路径。另外,具有较大孔的多孔膜有利于电解质渗透,并为电荷转移反应提供较大的表面积。

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