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Sensing mechanism of hydrogen gas sensor based on RF-sputtered ZnO thin films

机译:基于射频溅射ZnO薄膜的氢气传感器传感机理

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The mechanism of hydrogen (H_2) gas sensing in the range of 200-1000 ppm of RF-sputtered ZnO films was studied. The I-V characteristics as a function of operating temperature proved the ohmic behaviour of the contacts to the sensor. The complex impedance spectrum (IS) of the ZnO films showed a single semicircle with shrinkage in the diameter as the temperature increased. The best fitting of these data proved that the device structure can be modelled as a single resistance-capacitance equivalent circuit. It was suggested that the conductivity mechanism in the ZnO sensor is controlled by surface reaction. The impedance spectrum also exhibited a decreased in semicircle radius as the hydrogen concentration was increased in the range from 200 ppm to 1000 ppm.
机译:研究了氢(H_2)气体在RF溅射ZnO薄膜的200-1000 ppm范围内的感应机理。 I-V特性随工作温度的变化证明了传感器触点的欧姆特性。 ZnO薄膜的复阻抗谱(IS)显示一个半圆,随着温度的升高,其直径会缩小。这些数据的最佳拟合证明,该器件结构可以建模为单个电阻-电容等效电路。有人认为,ZnO传感器的电导率机制受表面反应控制。当氢浓度在200 ppm至1000 ppm范围内增加时,阻抗谱的半圆半径也减小。

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