Health and efficiency in MOCVD

摘要

Several clear trends are appearing in the ongoing development of epitaxial processes such as MOCVD. One over-riding requirement is yield/efficiency, others include con-formance to pollution control and these often go hand in hand.Throughput and yield are of paramount importance so as to continually reduce the cost of epiwafers and hence devices. In this editorial attention turns to trends in MOCVD precursors.