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首页> 外文期刊>IEICE Transactions on Electronics >Pinpoint Two-Photon Writing and Multi-Beam Interferential Patterning of Three-Dimensional Polymer Photonic Crystals
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Pinpoint Two-Photon Writing and Multi-Beam Interferential Patterning of Three-Dimensional Polymer Photonic Crystals

机译:三维聚合物光子晶体的精确双光子写入和多光束干涉构图

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摘要

Lasers have been established as a unique nanoprocess-ing tool due to its intrinsic three-dimensional (3D) fabrication capability and the excellent compatibility to various functional materials. Here we report two methods that have been proved particularly promising for tailoring 3D photonic crystals (PhCs): pinpoint writing via two-photon photopolymerization and multibeam interferential patterning. In the two-photon fabrication, a finely quantified pixel writing scheme and a method of pre-compensation to the shrinkage induced by polymerization enable high-reproducibility and high-fidelity prototyping; well-defined diamond-lattice PhCs prove the arbitrary 3D processing capability of the two-photon technology. In the interference patterning method, we proposed and utilized a two-step exposure approach, which not only increases the number of achievable lattice types, but also expands the freedom in tuning lattice constant.
机译:由于其固有的三维(3D)制造能力以及对各种功能材料的出色兼容性,激光器​​已被确立为独特的纳米加工工具。在这里,我们报告了两种已被证明在定制3D光子晶体(PhC)方面特别有前途的方法:通过双光子光聚合和多光束干涉图案进行精确写入。在双光子制造中,精细量化的像素写入方案和对聚合引起的收缩的预补偿方法可以实现高重现性和高保真度原型制作;定义明确的菱形晶格PhC证明了双光子技术的任意3D处理能力。在干涉图案化方法中,我们提出并利用了两步曝光方法,该方法不仅增加了可达到的晶格类型数量,而且扩大了调整晶格常数的自由度。

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