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On-Chip Charged Device Model ESD Protection Design Method Using Very Fast Transmission Line Pulse System for RF Ics

机译:射频集成电路的超快速传输线脉冲系统的片上充电设备模型ESD保护设计方法

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摘要

An on-chip Charged Device Model (CDM) ESD protection method for RF ICs is proposed in a 0.13μm RF process and evaluated by using very fast Transmission Line Pulse (vf-TLP) system. Key design parameters such as triggering voltage (V_(t1)) and the oxide breakdown voltage from the vf-TLP measurement are used to design input ESD protection circuits for a RF test chip. The characterization and the behavior of a Low Voltage Triggered Silicon Controlled Rectifier (SCR) which used for ESD protection clamp under vf-TLP measurements are also reported. The results measured by vf-TLP system showed that the triggering voltage decreased and the second breakdown current increased in comparison with the results measured by a standard 100 ns TLP system. From the HBM/CDM testing, the RF test chip successfully met the requested RF ESD withstand level, HBM 1 kV, MM 100 V and CDM 500 V.
机译:提出了一种在0.13μm射频工艺中针对射频IC的片上充电设备模型(CDM)ESD保护方法,并通过使用非常快的传输线脉冲(vf-TLP)系统对其进行了评估。关键设计参数,例如触发电压(V_(t1))和来自vf-TLP测量的氧化物击穿电压,用于设计RF测试芯片的输入ESD保护电路。还报告了在vf-TLP测量下用于ESD保护钳位的低压触发可控硅整流器(SCR)的特性和性能。 vf-TLP系统测量的结果表明,与标准100 ns TLP系统测量的结果相比,触发电压降低了,第二击穿电流增加了。通过HBM / CDM测试,RF测试芯片成功达到了所要求的RF ESD承受水平:HBM 1 kV,MM 100 V和CDM 500V。

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