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Investigation of Adjustable Current-Voltage Characteristics and Hysteresis Phenomena for Multiple-Peak Negative Differential Resistance Circuit

机译:多峰负差分电阻电路的可调电流电压特性和滞后现象的研究

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摘要

A multiple-peak negative differential resistance (NDR) circuit made of standard Si-based metal-oxide-semiconductor field-effect-transistor (MOS) and SiGe-based heterojunction bipolar transistor (HBT) is demonstrated. We can obtain a three-peak I-V curve by connecting three cascoded MOS-HBT-NDR circuits by suitably designing the MOS parameters. This novel three-peak NDR circuit possesses the adjustable current-voltage characteristics and high peak-to-valley current ratio (PVCR). We can adjust the PVCR values to be as high as 11.5, 6.5, and 10.3 for three peaks, respectively. Because the NDR circuit is a very strong nonlinear element, we discuss the extrinsic hysteresis phenomena in this multiple-peak NDR circuit. The effect of series resistance on hysteresis phenomena is also investigated. Our design and fabrication of the NDR circuit is based on the standard 0.35 μm SiGe BiCMOS process.
机译:说明了由标准的基于Si的金属氧化物半导体场效应晶体管(MOS)和基于SiGe的异质结双极晶体管(HBT)构成的多峰负差分电阻(NDR)电路。通过适当设计MOS参数,通过连接三个级联的MOS-HBT-NDR电路,我们可以获得三峰I-V曲线。这种新颖的三峰NDR电路具有可调节的电流电压特性和高峰谷电流比(PVCR)。我们可以将三个峰的PVCR值分别调整为分别高达11.5、6.5和10.3。由于NDR电路是一个非常强的非线性元件,因此我们讨论了此多峰NDR电路中的非本征磁滞现象。还研究了串联电阻对磁滞现象的影响。我们的NDR电路的设计和制造基于标准的0.35μmSiGe BiCMOS工艺。

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