紫外光照射下電圧印加分極反転MgO：LiNbO_3導波路擬似位相整合第2高調波発生デバイス

摘要

様々な非線形光学デバイスに応用可能なMgO：LiNbO_3周期分極反転構造を作製する方法として、我々は独自の作製法である紫外光照射下室温2段階電圧印加法を見出した。この方法はリソグラフィや加熱等が不要で簡便な作製法であり、2段階の電圧印加を行って結晶貫通分極反転構造を得る。この方法で作製した周期分極反転構造を用いて導波路波長変換デバイスを作製し、実験を行って理論予測と近い結果を得、紫外光照射下室温2段階電圧印加法の有用性を実証した。%We have proposed a new simple method for fabrication of domain-inverted gratings in MgO:LiNbO_3, i.e., 2-step voltage application under ultraviolet light. The method is simple in that this does not require lithography process and crystal heating. We found that 2-step voltage application is effective for fabrication of domain-inverted gratings over entire crystal thickness. A high quality grating of 19um period was formed and applied to a waveguide quasi-phase-matched second-harmonic generation (QPM-SHG) device for pumping at 1.55um wavelength. High applicability of the method to QPM device fabrication was demonstrated.